DTL光刻助力破局AI&CPO 瓶颈,定义DFB/DBR激光光栅量产新标准!

6月16日，我司创始人Harun发布行业深度观点，精准拆解AI硬件与CPO光互联产业核心痛点，明确高精度光栅光刻工艺是产业突破的关键壁垒。

原文译文：

In AI hardware the biggest bottleneck isn't the processing power of the GPU/TPU chip itself. It is the speed and energy cost of moving data between the AI chip and memory or other processors. The industry is going to incredible lengths to address the huge energy demand as we all witness.  

AI硬件的最大瓶颈，并非芯片算力不足，而是AI芯片与内存、处理器之间的数据传输速率低、能耗高。目前全行业都在全力攻坚AI算力带来的高能耗难题。

Use of optical communication and co-packaged optics (CPO) promises to significantly reduce energy consumption while dramatically increasing the speed of AI systems and data centers.  

光通信与共封装光学（CPO）是破局关键，可大幅降低系统能耗，同时跨越式提升AI设备、数据中心的传输速度。

Semiconductor lasers are at the very heart of this communication challenge. DFB and DBR lasers are the leading choices to generate the required light with the necessary spectral purity and power.  

半导体激光器是CPO光互联的核心器件。其中DFB、DBR激光器凭借优异的光谱纯度与稳定功率，成为AI光通信的主流核心光源。

Both DFB and DBR lasers require printing high-fidelity, high-resolution gratings for precise wavelength selection. EULITHA has been working with leading device manufacturers to provide the lithography tools that meet the rigorous quality and volume requirements of the booming AI market.  

DFB、DBR激光器的精准波长筛选，完全依赖高保真、超高分辨率光栅结构。针对爆发式增长的AI光互联市场，EULITHA携手全球头部厂商，以高端光刻设备，满足行业严苛的品质标准与规模化量产需求。

EULITHA's tools are specifically engineered to print the precise periodic patterns required for lasers in AI systems. We are proud to contribute to this incredible revolution.

EULITHA设备专为AI激光芯片的高精度周期图形光刻定制研发，以核心微纳光刻技术，助力AI光互联产业革新。

针对DFB/DBR激光光栅量产痛点，EULITHA光刻设备创造性DTL技术优势：

• 高分辨率（60nm half-pitch），高批量生产效率≥35片/小时，针对2~6寸晶圆，可以单场曝光整片。

• 可以曝光均匀光栅和渐进式相移光栅。

• λ-Litho 仿真软件，快速将图案需求转换为制版版图。